Area fill synthesis for uniform layout density
نویسندگان
چکیده
Chemical-mechanical polishing (CMP) and other manufacturing steps in very deep submicron VLSI have varying effects on device and interconnect features, depending on local characteristics of the layout. To improve manufacturability and performance predictability, we seek to make a layout uniform with respect to prescribed density criteria, by inserting “area fill” geometries into the layout. In this paper, we make the following contributions. First, we define the flat, hierarchical and multiple-layer filling problems, along with a unified density model description. Secondly, for the flat filling problem, we summarize current linear programming approaches with two different objectives, i.e., the Min-Var and Min-Fill objectives. We then propose several new Monte-Carlo based filling methods with fast dynamic data structures. Third, we give practical iterated methods for layout density control for CMP uniformity based on linear programming, Monte-Carlo and greedy algorithms. Fourth, to address the large data volume and inherent lack of scalability of flat layout density control, we propose practical methods for hierarchical layout density control. These methods smoothly trade off runtime, solution quality, and output data volume. Finally, we extend the linear programming approaches and present new Monte-Carlo based methods for the multiple-layer filling problem. Comparisons with previous filling methods show the advantages of the new iterated Monte-Carlo and iterated greedy methods for both flat and hierarchical layouts, and for both density models (spatial density and effective density). We achieve nearoptimal filling for flat layouts with respect to each of these objectives. Our experiments indicate that the hybrid hierarchical filling approach is efficient, scalable, accurate, and highly competitive with existing methods (e.g., linear-programming based techniques) for hierarchical layouts. This research was supported by a Packard Foundation Fellowship, by the MARCO Gigascale Silicon Research Center, by NSF Young Investigator Award MIP-9457412, by NSF grant CCR-9988331, and by a grant from Cadence Design Systems, Inc. Y. Chen is with the Department of Computer Science, UC Los Angeles, Los Angeles, CA 90095-1596. E-mail: [email protected]. A. B. Kahng is with the Departments of Computer Science and Engineering, and of Electrical and Computer Engineering, UC San Diego, La Jolla, CA 92093-0114. E-mail: [email protected]. G. Robins is with the Department of Computer Science, University of Virginia, Charlottesville, VA 22903-2442. E-mail: [email protected]. A. Zelikovsky is with the Department of Computer Science, Georgia State University, Atlanta, GA 30303. E-mail: [email protected].
منابع مشابه
Filling algorithms and analyses for layout density control
In very deep-submicron very large scale integration (VLSI), manufacturing steps involving chemical-mechanical polishing (CMP) have varying effects on device and interconnect features, depending on local characteristics of the layout. To reduce manufacturing variation due to CMP and to improve performance predictability and yield, the layout must be made uniform with respect to certain density c...
متن کاملNew and Exact Filling Algorithms for Layout Density Control
To reduce manufacturing variation due to chemicalmechanical polishing and to improve yield, layout must be made uniform with respect to density criteria. This is achieved by layout postprocessing to add ll geometries, either at the foundry or, for better convergence of performance veri cation ows, during layout synthesis [10]. This paper proposes a new min-variation objective for the synthesis ...
متن کاملCoupling-Constrained Dummy Fill for Density Gradient Minimization
Dummy fill is typically performed by foundries to achieve layout pattern uniformity for chip yield enhancement. However, filling dummies may greatly increase interconnect coupling capacitance and lead to explosion of mask data. Therefore, it is desirable to simultaneously consider the coupling constraints, the number of inserted dummies, and the density gradient during dummy fill. In this paper...
متن کاملNew Multilevel and Hierarchical Algorithms for Layout Density Control
Certain manufacturing steps in very deep submicron VLSI involve chemical-mechanical polishing (CMP) which has varying e ects on device and interconnect features, depending on local layout characteristics. To reduce manufacturing variation due to CMP and to improve yield and performance predictability, the layout needs to be made uniform with respect to certain density criteria, by inserting \ l...
متن کاملCompression Algorithms for \Dummy Fill" VLSI Layout Data
Dummy fill is introduced into sparse regions of a VLSI layout to equalize the spatial density of the layout, improving uniformity of chemical-mechanical planarization (CMP). It is now well-known that dummy fill insertion for CMP uniformity changes the back-end flow with respect to layout, parasitic extraction and performance analysis. Of equal import is dummy fill’s impact on layout data volume...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید
ثبت ناماگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید
ورودعنوان ژورنال:
- IEEE Trans. on CAD of Integrated Circuits and Systems
دوره 21 شماره
صفحات -
تاریخ انتشار 2002